Examination of cross sections of thin films by atomic force microscopy

Journal of the Electrochemical Society

Volumn 146, Issue 10, 1999, Pages 3711-3715

  Echeverria, F ^a,b,c   Skeldon, P ^a,b,c   Thompson, G E ^a,b,c   Habazaki, H ^a,b,c   Shimizu, K ^a,b,c  

^a UNIVERSITY OF MANCHESTER   (United Kingdom)

^b TOHOKU UNIVERSITY   (Japan)

^c KEIO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ATOMIC FORCE MICROSCOPY; MORPHOLOGY; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

ANODIC FILMS;

SEMICONDUCTING FILMS;

EID: 0033339847     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1392538     Document Type: Article

References (5)

1. J.R. Smith, S. A. Campbell, and F. C. Walsh, Trans. Inst. Met. Finish., 76, B53 (1998).
2. Q. Zong, D. Inniss, K. Kjoller, and V. B. Elings, Surf. Sei., 290, L688 (1993).
3. R.M. Feenstra, Semicond. Sei. Teclmol, 9, 2157 (1994).
4. F. Echevenia, P. Skeldon, G. E. Thompson, H. Habazaki, and K. Shimizu, Electrochem. Solid State Lett., 1, 24 (1998).
5. A.C. Harkness and L. Young, Can. J. Chem., 44,2409 (1966).