Schottky emitter using boron-doped diamond

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 3, 2004, Pages 1349-1352

  Bae, Joon Hyung ^a   Minh, Phan Ngoc ^a   Ono, Takahito ^a   Esashi, Masayoshi ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BORON; CHEMICAL VAPOR DEPOSITION; DEPOSITION; DIAMONDS; DOPING (ADDITIVES); ELECTRIC FIELD EFFECTS; ELECTRON EMISSION; ETCHING; HEATING; ION BOMBARDMENT; MOLDING; OXIDATION; VAPORIZATION;

EMISSION CURRENTS; MICROELECTRON SOURCES; SCHOTTKY EMITTERS; SILICON MOLDING TECHNIQUES;

ELECTRON SOURCES;

EID: 3242687102     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1736640     Document Type: Conference Paper

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