Development of an advanced high efficiency electro-emission device

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 3, 2004, Pages 1367-1371

  Sakemura, Kazuto ^a   Negishi, Nobuyasu ^a   Yamada, Takashi ^a   Satoh, Hideo ^a   Watanabe, Atsushi ^a   Yoshikawa, Takamasa ^a   Ogasawara, Kiyohide ^a   Koshida, Nobuyoshi ^b  

^a PIONEER CORPORATION   (Japan)

^b TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON NANOTUBES; CATHODES; ELECTRIC FIELDS; ELECTRIC POTENTIAL; MIM DEVICES; MIS DEVICES; SCANNING ELECTRON MICROSCOPY; SILICON; THIN FILMS; VACUUM APPLICATIONS;

FIELD-INDUCED TUNNELING; HIGH EFFICIENCY ELECTRO-EMISSION DEVICE (HEED); SILICON DIODES; THIN FILM DEPOSITION;

ELECTRON EMISSION;

EID: 3242680906     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1740759     Document Type: Conference Paper

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