Development of ballistic electron cold cathode by a low-temperature processing of polycrystalline silicon films

Journal of Crystal Growth

Volumn 237-239, Issue 1 4III, 2002, Pages 1915-1919

  Ichihara, Tsutomu ^a   Honda, Yoshiaki ^a   Aizawa, Koichi ^a   Komoda, Takuya ^a   Koshida, Nobuyoshi ^b  

^a PANASONIC CORPORATION   (Japan)

^b TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY   (Japan)

Author keywords

A1. Crystallites; A1. Nanostructures; B2. Semiconducting silicon; B3. Cold cathode

Indexed keywords

BALLISTICS; ELECTRON EMISSION; GLASS; LOW TEMPERATURE EFFECTS; NANOSTRUCTURED MATERIALS; OXIDATION; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON; SUBSTRATES;

COLD CATHODES;

COLD CATHODE TUBES;

EID: 0036530469     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(01)02245-X     Document Type: Article

References (9)