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Volumn PV 2005-03, Issue , 2005, Pages 99-106

Total-dose radiation hardness of the SOI 4-gate transistor (G 4-FET)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DOSIMETERS; IRRADIATION; PARAMETER ESTIMATION; SILICON ON INSULATOR TECHNOLOGY;

EID: 31844449766     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (9)

References (11)
  • 4
    • 0022600166 scopus 로고
    • Simple technique for separating the effects of interface traps and trapped-oxide charge in metal-oxide-semiconductor transistors
    • P. J. McWhorter and P. S. Winokur, "Simple Technique for Separating the Effects of Interface Traps and Trapped-Oxide Charge in Metal-Oxide- Semiconductor Transistors", Appl. Phys. Lett., 48, 133, (1986).
    • (1986) Appl. Phys. Lett. , vol.48 , pp. 133
    • McWhorter, P.J.1    Winokur, P.S.2
  • 5
    • 0025669259 scopus 로고
    • Modeling the anneal of radiation-induced trapped holes in a varying thermal environment
    • P. J. McWhorter, S. L. Miller, and W. M. Miller, "Modeling the Anneal of Radiation-Induced Trapped Holes in a Varying Thermal Environment", IEEE Trans. Nucl. Sci., 37, 1682, (1990).
    • (1990) IEEE Trans. Nucl. Sci. , vol.37 , pp. 1682
    • McWhorter, P.J.1    Miller, S.L.2    Miller, W.M.3
  • 7
    • 0033353323 scopus 로고    scopus 로고
    • Gate-all-around OTA's for rad-hard and high temperature analog applications
    • A. Vandooren, J. P. Colinge and D. Flandre, "Gate-All-Around OTA's for Rad-Hard and High Temperature Analog Applications" IEEE Trans. Nucl. Sci., 46, (1999).
    • (1999) IEEE Trans. Nucl. Sci. , vol.46
    • Vandooren, A.1    Colinge, J.P.2    Flandre, D.3
  • 8
    • 0026385067 scopus 로고
    • Response of interface traps during high-temperature anneals
    • A. J. Lelis, T. R. Oldham, W. M. Delancey, "Response of Interface Traps During High-Temperature Anneals", IEEE Trans. Nucl. Sci., 38, 1590, (1991).
    • (1991) IEEE Trans. Nucl. Sci. , vol.38 , pp. 1590
    • Lelis, A.J.1    Oldham, T.R.2    Delancey, W.M.3
  • 11
    • 0033346711 scopus 로고    scopus 로고
    • Considerations on isochronal anneal technique: From measurement to physics
    • O. Flament, P. Paillet, J. L. Leray, "Considerations on Isochronal Anneal Technique: from Measurement to Physics", IEEE Trans. Nucl. Sci., 46, 1526, (1999).
    • (1999) IEEE Trans. Nucl. Sci. , vol.46 , pp. 1526
    • Flament, O.1    Paillet, P.2    Leray, J.L.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.