Reactive ion etching of CVD diamond thin films in O2/CF4 plasma

Czechoslovak Journal of Physics

Volumn 54, Issue SUPPL. 3, 2004, Pages

  Misu, T ^a   Goto, M ^a   Arai, T ^a  

^a KANAGAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 31844446050     PISSN: 00114626     EISSN: 15729486     Source Type: Journal    
DOI: 10.1007/BF03166523     Document Type: Article

References (4)

1. O. Dorsch, M. Werner, E. Obermeier, R. E. Harper, C. Johnson, I. M. Bickley-Golder: Diamond and Related Materials 1 (1992) 277.
2. H. Shiomi: Jpn. J. Appl. Phys. 36 (1997) 7745.
3. R. E. Walkup, K. L. Saenger, G. S. Selwyn: J. Chem. Phys. 84 (1986) 2668.
4. M. J. Kushner: J. Appl. Phys. 53 (1982) 2939.