The effect of backside particles on substrate topography

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 10, 2005, Pages 7409-7413

  Bearda, Twan ^a   Mertens, Paul W ^a   Holsteyns, Frank ^a   De Bisschop, Peter ^a   Compen, René ^b   Van Meer, Aschwin ^b   Heyns, Marc M ^a  

^a IMEC   (Belgium)

^b ASML   (Netherlands)

Author keywords

Contamination; Hot spots; Lithography; Particles; Topography

Indexed keywords

COMPUTER SIMULATION; CONTAMINATION; ELASTICITY; PLASTIC DEFORMATION; SURFACE TOPOGRAPHY;

ELASTIC DEFORMATIONS; HOT SPOTS; PRESSURE DIFFERENCE;

SILICON WAFERS;

EID: 31544476562     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.7409     Document Type: Article

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