Electrical behavior of germanium oxide/germanium interface prepared by electron-cyclotron-resonance plasma oxidation in capacitance and conductance measurements

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 11, 2005, Pages 7928-7930

  Fukuda, Yukio ^a   Ueno, Tomoo ^b   Hirono, Shigeru ^c  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

^b TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY   (Japan)

^c NTT CORPORATION   (Japan)

Author keywords

Capacitance method; Conductance method; ECR plasma oxidation; GeOx Ge interface; Interface trap

Indexed keywords

CAPACITANCE; ELECTRIC CONDUCTANCE; ELECTRON CYCLOTRON RESONANCE; GERMANIUM COMPOUNDS; OXIDATION; PLASMA APPLICATIONS; SURFACE CHEMISTRY;

CAPACITANCE METHOD; ECR PLASMA OXIDATION; INTERFACE TRAP;

ELECTRIC PROPERTIES;

EID: 31544471654     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.7928     Document Type: Article

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