Positronium time-of-flight measurements of porous silsesquioxane films

Materials Science Forum

Volumn 445-446, Issue , 2004, Pages 361-363

  Yu, R S ^a   Kobayashi, Y ^a   Ohdaira, T ^a   Suzuki, R ^a   Ito, K ^a   Hirata, K ^a   Sato, K ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Hydrogen Silsesquioxane; Porous Film; Positronium; Time of Flight

Indexed keywords

ATOMIC PHYSICS; ELLIPSOMETRY; HYDROGEN; INTEGRATED CIRCUITS; OPTIMIZATION; PERMITTIVITY; PORE SIZE; POROSITY; POSITRONS; REFRACTIVE INDEX; SPECTROMETERS;

HYDROGEN-SILSESQUIOXANE; POROUS FILMS; POSITRONIUM; TIME-OF-FLIGHT (TOF);

DIELECTRIC FILMS;

EID: 3142774413     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: None     Document Type: Conference Paper

References (6)

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