Structural properties of TiO2-WO3 thin films prepared by r.f. sputtering

Journal of Materials Science: Materials in Electronics

Volumn 15, Issue 8, 2004, Pages 527-531

  Komornicki, S ^a   Radecka, M ^a   Sobas P ^a  

^a AGH UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; FILM PREPARATION; METALLIC FILMS; PHASE COMPOSITION; PHASE TRANSITIONS; SCANNING ELECTRON MICROSCOPY; SPUTTERING; STRUCTURE (COMPOSITION); TITANIUM DIOXIDE; TUNGSTEN COMPOUNDS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

DEPOSITION RATE; METALLIC MOSAIC TARGETS; RADIO FREQUENCY REACTIVE SPUTTERING; TUNGSTEN TRIOXIDE; X RAY ELECTRON MICROPROBE;

THIN FILMS;

EID: 3142746002     PISSN: 09574522     EISSN: None     Source Type: Journal    
DOI: 10.1023/B:JMSE.0000032587.22033.d0     Document Type: Article

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