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Volumn 37, Issue 13, 2004, Pages 1732-1735
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Comparative study of SoI/Si hybrid substrates fabricated using high-dose and low-dose oxygen implantation
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Author keywords
[No Author keywords available]
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Indexed keywords
ION IMPLANTATION;
MICROPROCESSOR CHIPS;
OXYGEN;
PHASE SEPARATION;
SEMICONDUCTING SILICON;
SEMICONDUCTOR DEVICE MANUFACTURE;
SUBSTRATES;
TRANSMISSION ELECTRON MICROSCOPY;
CROSS SECTIONAL TRANSMISSION ELECTRON MICROSCOPY (XTEM);
HYBRID SUBSTRATES;
LOW-K DIELECTRICS;
OXYGEN IMPLANTATION;
SILICON ON INSULATOR TECHNOLOGY;
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EID: 3142728772
PISSN: 00223727
EISSN: None
Source Type: Journal
DOI: 10.1088/0022-3727/37/13/002 Document Type: Article |
Times cited : (2)
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References (15)
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