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Volumn 37, Issue 13, 2004, Pages 1732-1735

Comparative study of SoI/Si hybrid substrates fabricated using high-dose and low-dose oxygen implantation

Author keywords

[No Author keywords available]

Indexed keywords

ION IMPLANTATION; MICROPROCESSOR CHIPS; OXYGEN; PHASE SEPARATION; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY;

EID: 3142728772     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/37/13/002     Document Type: Article
Times cited : (2)

References (15)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.