Nanoscale cube-on-cube growth and characterization of SrS:Eu, Sm optical memory material

Journal of Crystal Growth

Volumn 268, Issue 3-4 SPEC. ISS., 2004, Pages 602-606

  Teo, K L ^a   Chen, C ^a   Chong, T C ^a,b  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b DATA STORAGE INSTITUTE   (Singapore)

Author keywords

A1. Reflection high energy electron diffraction; A3. Molecular beam epitaxy; B1. Sulfides; B2. Semiconducting II VI materials

Indexed keywords

ANNEALING; CONCENTRATION (PROCESS); CRYSTAL GROWTH; DOPING (ADDITIVES); ELECTRON TRAPS; EUROPIUM; HIGH ENERGY ELECTRON DIFFRACTION; INFRARED RADIATION; IRRADIATION; LASER BEAMS; LUMINESCENCE OF SOLIDS; PHOSPHORS; SINGLE CRYSTALS; STRONTIUM COMPOUNDS; SURFACE STRUCTURE; X RAY DIFFRACTION;

OPTICAL MEMORY MATERIALS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION (RHEED); SEMICONDUCTING II-IV MATERIALS; SULFIDES;

NANOSTRUCTURED MATERIALS;

EID: 3142691932     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2004.04.099     Document Type: Conference Paper

References (13)

1. Jutamulia S., Storti G., Lindmayer J., Seiderman W. Proc. Soc. Photo-Opt Instrum. Eng. 1151:1990;83.
2. Soltani P., Brower D., Storti G. Proc. Soc. Photo-Opt. Instrum. Eng. 1243:1990;114.
3. Jutamulia S., Storti G., Lindmayer J., Seiderman W. Appl. Opt. 30:1991;1786.
4. Lindmayer J. Solid State Technol. 8:1988;135.
5. Helbing R., Birecki H., DiCarolis S.A., Feigelson R.S., Hiskes R. J. Crystal Growth. 146:1995;599.
6. Tong W., Yang T., Park W., Chaichimansour M., Schön S., Wanger B.K., Summers C.J. J. Electron Matter. 26:1997;728.
7. Dey S., Jin Yun Sun Appl. Surf. Sci. 143:1999;191.
8. Ohnishi H., Sakuma N., Ieyasu K., Hamakawa Y. J. Electrochem. Soc. 130:1983;2115.
9. Poelman D., Vercaemst R., Van Meirhaeghe R.L., Laflère W.H., Cardon F. J. Lumin. 75:1997;175.
10. Piqué A., Auyeung R.C.Y., Qadri S.B., Kim H., Justus B.L., Huston A. Thin Solid Films. 377:2000;803.
11. Wu J.P., Newman D., Viney I.V.F. J. Lumin. 99:2002;237.
12. Calderbank R., Laroia R., McLaughlin S.W. IEEE Trans. Commun. 46:1998;1011.
13. Kravets V.G., Kryuchin A.A., Ataev V.A., Shershukov V.M. Opt. Mater. 19:2001;421.