Laser-induced bulk damage of various types of silica glasses at 532 and 355 nm

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 5 A, 2004, Pages 2547-2548

  Kuzuu, Nobu ^a   Yoshida, Kunio ^b   Ochi, Kanyoshi ^b   Tsuboi, Yoshitaka ^b   Kamimura, Tomosumi ^c   Yoshida, Hidetsugu ^d   Namba, Yoshiharu ^e  

^a UNIVERSITY OF FUKUI   (Japan)

^b OSAKA INSTITUTE OF TECHNOLOGY   (Japan)

^c KOCHI NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

^d OSAKA UNIVERSITY   (Japan)

^e CHUBU UNIVERSITY   (Japan)

Author keywords

Fused quartz; Laser induced damage; Nd: YAG laser; Silica glass; Synthetic fused silica

Indexed keywords

ANNEALING; LASER BEAM EFFECTS; LASER PULSES; LIGHT ABSORPTION; LITHOGRAPHY; NEODYMIUM LASERS; PHOTONS; QUARTZ;

FUSED QUARTZ (FQ); LASER-INDUCED DAMAGE; NANOSECOND LASERS (NSL); SYNTHETIC FUSED SILICA;

FUSED SILICA;

EID: 3142661174     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.2547     Document Type: Article

References (6)

1. Hishoushitsu Shirika Zairyou Ouyou Handobukku (Handbook for Application of Amorphous Silica), eds. H. Kawazoe, K. Awazu, Y. Ohki, N. Kuzuu, S. Todoroki, A. Hayashi and H. Fukuda (Realize Inc., Tokyo, 1999).
2. K. Yoshida, H. Yoshida, T. Kamimura and N. Kuzuu; Jpn. J. Appl. Phys. 37 (1998) 1882.
3. N. Kuzuu, K. Yoshida, H. Yoshida, T. Kamimura and N. Kamisugi: Appl. Opt. 38 (1999) 2510.
4. Tosoh Quartz Co., Ltd. Production Catalog. All sample names used in this paper are the trade marks of Tosoh Quartz Co., Ltd.
5. N. Kuzuu and M. Murahara: Phys. Rev. B 47 (1993) 3083.
6. N. Kuzuu, H. Horikoshi, T. Nishimura and Y. Kokubo: J. Appl. Phys. 93 (2003) 9062.