Effects of heat treatment on absorption bands in OH-free and OH-contalning fused quartz

Journal of Applied Physics

Volumn 93, Issue 11, 2003, Pages 9062-9071

  Kuzuu, Nobu ^a   Horikoshi, Hideharu ^b   Nishimura, Tsutomu ^c   Kokubo, Yosuke ^c  

^a UNIVERSITY OF FUKUI   (Japan)

^b TOSOH CORPORATION   (Japan)

^c ORC MANUFACTURING CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; DECOMPOSITION; FLUORESCENCE; OXIDATION; QUARTZ; SILICON WAFERS;

FUSED QUARTZ;

HEAT TREATMENT;

EID: 0038650935     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1572542     Document Type: Article

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