Taking the wet-developable route to applying BARC in implant layers

Solid State Technology

Volumn 47, Issue 6, 2004, Pages 61-64

  Shao, Xie ^a   Guerrero, Alice ^a   Gu, Yiming ^b  

^a BREWER SCIENCE INC   (United States)

^b INTEGRATED DEVICE TECHNOLOGY INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BOTTOM ANTIREFLECTIVE COATINGS (BARC); LINE ETCH PLACEMENT (LEP); REFLECTIVE NOTCHING; SHALLOW-TRENCH ISOLATION (STI);

CHEMICAL MECHANICAL POLISHING; CMOS INTEGRATED CIRCUITS; DRY ETCHING; OPTIMIZATION; ORGANIC ACIDS; PHOTOLITHOGRAPHY; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE; SILICA; SILICON WAFERS;

ANTIREFLECTION COATINGS;

EID: 3142658177     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Review

References (7)

1. Y. Gu, J. Sturtevant, "Implant layers: 'Non-critical' Lithography?" Microlithography World, pp. 18-20, 22, Nov. 2002.
2. Y. Gu, D. Chou, S.Y. Lee, W.R. Roche, J. Sturtevant, "Reduction of Implantation Shadowing Effect by Dual-wavelength Exposure Photo Process," Proc. SPIE, Vol. 5039, pp. 1312-1318, 2003
3. Y. Gu, D. Chou, C. Lom, J. Sturtevant, "Implant Layer Lithography: Who Says It's 'Non-critical?'" ARC Symposium, Oct. 2003.
4. US Patent No.4,910,122,"Antireflective Coating," J.Arnold, T.L. Brewer, S. Punyakumleard, March 20, 1990.
5. US Patent No. 5,057,399, "Method for Making Polyimide Microlithographic Compositions Soluble in Alkaline Media," T. Flaim, J. Lamb, G. Barnes, T.L. Brewer, Oct. 15, 1991.
6. US Patent No. 5,688,987 and US Patent No. 5,892,096, "Non-subliming Mid-UV Dyes and Ultra-thin Organic Arcs Having Differential Solubility," J. Meador, X. Shao, V. Krishnamurthy, E. Murphy, T. Flaim, et al., Nov. 18, 1997, and April 6, 1999.
7. P. Williams, X. Shao, "Process Consideration for Organic Bottom Antireflective Coating Optimization for Front- and Back-End of Line Integration," SEMICON China, pp. 229-238, 2003.