Advanced RF metrology for plasma process control

Semiconductor International

Volumn 26, Issue 11, 2003, Pages 61-66

  Coumou, David ^a  

^a MKS Instruments   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AUTOMATED PROCESS CONTROL (APC); FREQUENCY TRACKING; PLASMA PROCESS CONTROL; RADIO FREQUENCY (RF) METROLOGY;

ACOUSTIC IMPEDANCE; ANALOG TO DIGITAL CONVERSION; BANDWIDTH; ELECTRIC FIELDS; ELECTRIC TRANSFORMERS; FIELD PROGRAMMABLE GATE ARRAYS; MAGNETIC FIELDS; OPTIMIZATION; PHASE LOCKED LOOPS; PLASMA ETCHING; PROCESS CONTROL; SENSORS; SIGNAL PROCESSING; SIGNAL TO NOISE RATIO; WATTMETERS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 3142549281     PISSN: 01633767     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (6)

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5. R.E. Crochiere and L.R Rabiner, Multirate Digital Signal Processing, Prentice Hall, 1983.
6. E.B. Hogenauer, "An Economical Class of Digital Filters for Decimation and Interpolation," IEEE Transactions on Acoustics, Speech and Signal Processing, Vol. 29, No. 2, 1981, p. 155.