Electrophoretic deposition of Pb (Zr, Ti) O3 powder on Si wafer: Morphological change across film thickness

Journal of the Ceramic Society of Japan

Volumn 114, Issue 1325, 2006, Pages 128-130

  Kang, Ni ^a   Li, Jing Feng ^a  

^a TSINGHUA UNIVERSITY   (China)

Author keywords

Electrophoretic deposition; Pb(Zr, Ti) O3 powder; Thick film

Indexed keywords

ELECTRIC FIELDS; ELECTRODEPOSITION; ELECTROPHORETIC COATINGS; ETHANOL; HYDROCHLORIC ACID; MICROSTRUCTURE; SURFACE CHEMISTRY; THICK FILMS;

ELECTROPHORETIC DEPOSITION (EPD; FILM THICKNESS; PB(ZR, TI) O3 POWDER; SILICON SUBSTRATES;

SILICON WAFERS;

EID: 31144471059     PISSN: 09145400     EISSN: 13486535     Source Type: Journal    
DOI: 10.2109/jcersj.114.128     Document Type: Article

References (13)

1. Kim, S. K., Kim, C.-S., Lee, K. W. and Lee, S. Y., Materials Science in Semiconductor Processing, Vol. 5, pp. 115-121 (2003).
2. Gong, W., Li, J.-F., Chu, X. C. and Li, L. T., J. Eur. Ceram. Soc., Vol. 24, pp. 2977-2982 (2004).
3. Thiele, E. S., Damjanovic, D. and Setter, N., J. Am. Ceram. Soc., Vol. 84, pp. 2863-2868 (2001).
4. Dorey, R. A. and Whatmore, R. W., J. Eur. Ceram. Soc., Vol. 24, pp. 1091-1094 (2004).
5. De, D. and Nicholson, P. S., J. Am. Ceram. Soc., Vol. 82, pp. 3031-3036 (1999).
6. Chen, C.-Y., Chen, S.-Y. and Liu, D.-M., Acta Mater., Vol. 47, pp. 2717-2726 (1999).
7. Kang, N., Gong, W., Liu, J. and Li, J.-F., J. Ceram. Soc. Japan, Suppl., Vol. 112, S506-S509 (2004).
8. Sakamoto, R., Nishimori, H., Tatsumisago, M. and Minami, T., J. Ceram. Soc. Japan, Vol. 106, pp. 1034-1036 (1998).
9. Zhang, Z. T., Huang, Y. and Jiang, Z. Z., J. Am. Ceram. Soc., Vol. 77, pp. 1946-1950 (1994).
10. Louh, R.-F. and Hsu, Y.-H., Mater. Chem. and Phys., Vol. 79, pp. 226-229 (2003).
11. Ma, J. and Cheng, W., J. Am. Ceram. Soc., Vol. 85, pp. 1735-1737 (2002).
12. Tassel, J. V. and Randall, C. A., J. Eur. Ceram. Soc., Vol. 19, pp. 955-958 (1999).
13. Wang, G., Sarkar, P. and Nicholson, P. S., J. Am. Ceram. Soc., Vol. 80, pp. 965-972 (1997).