메뉴 건너뛰기




Volumn 439, Issue 7074, 2006, Pages 303-306

Artificial 'spin ice' in a geometrically frustrated lattice of nanoscale ferromagnetic islands

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL LATTICES; FERROMAGNETIC MATERIALS; GLASS; LITHOGRAPHY; NANOSTRUCTURED MATERIALS; NEURAL NETWORKS;

EID: 31144454793     PISSN: 00280836     EISSN: 14764687     Source Type: Journal    
DOI: 10.1038/nature04447     Document Type: Article
Times cited : (916)

References (25)
  • 1
    • 33746571845 scopus 로고    scopus 로고
    • ed. Buschow, K. J. H. Elsevier Science, Amsterdam
    • Ramirez, A. P. in Handbook of Magnetic Materials Vol. 13 (ed. Buschow, K. J. H.) 423-520 (Elsevier Science, Amsterdam, 2001).
    • (2001) Handbook of Magnetic Materials , vol.13 , pp. 423-520
    • Ramirez, A.P.1
  • 2
    • 84892407138 scopus 로고    scopus 로고
    • Magnets with strong geometric frustration
    • Moessner, R. Magnets with strong geometric frustration. Can. J. Phys. 79, 1283-1294 (2001).
    • (2001) Can. J. Phys. , vol.79 , pp. 1283-1294
    • Moessner, R.1
  • 4
    • 0000153059 scopus 로고    scopus 로고
    • Ising pyrochlore magnets: Low-temperature properties, "ice rules," and beyond
    • Siddharthan, R. et al. Ising pyrochlore magnets: low-temperature properties, "ice rules," and beyond. Phys. Rev. Lett. 83, 1854-1857 (1999).
    • (1999) Phys. Rev. Lett. , vol.83 , pp. 1854-1857
    • Siddharthan, R.1
  • 6
    • 0035900336 scopus 로고    scopus 로고
    • Spin ice state in frustrated magnetic pyrochlore materials
    • Bramwell, S. T. & Gingras, M. J. P. Spin ice state in frustrated magnetic pyrochlore materials. Science 294, 1495-1501 (2001).
    • (2001) Science , vol.294 , pp. 1495-1501
    • Bramwell, S.T.1    Gingras, M.J.P.2
  • 9
    • 1642369573 scopus 로고    scopus 로고
    • 7 spin ice
    • 7 spin ice. Phys. Rev. B 69, 064414 (2004).
    • (2004) Phys. Rev. B , vol.69 , pp. 064414
    • Snyder, J.1
  • 10
    • 0032620706 scopus 로고    scopus 로고
    • Magnetic field induced transitions from spin glass to liquid to long range order in a 3D geometrically frustrated magnet
    • Tsui, Y. K., Burns, C. A., Snyder, J. & Schiffer, P. Magnetic field induced transitions from spin glass to liquid to long range order in a 3D geometrically frustrated magnet. Phys. Rev. Lett. 82, 3532-3535 (1999).
    • (1999) Phys. Rev. Lett. , vol.82 , pp. 3532-3535
    • Tsui, Y.K.1    Burns, C.A.2    Snyder, J.3    Schiffer, P.4
  • 12
    • 4043070508 scopus 로고    scopus 로고
    • Correlations and disorder in arrays of magnetically coupled superconducting rings
    • Davidovic, D. et al. Correlations and disorder in arrays of magnetically coupled superconducting rings. Phys. Rev. Lett. 76, 815-818 (1996).
    • (1996) Phys. Rev. Lett. , vol.76 , pp. 815-818
    • Davidovic, D.1
  • 13
    • 0037422109 scopus 로고    scopus 로고
    • Ordering and manipulation of the magnetic moments in large-scale superconducting π-loop arrays
    • Hilgenkamp, H. et al. Ordering and manipulation of the magnetic moments in large-scale superconducting π-loop arrays. Nature 422, 50-53 (2003).
    • (2003) Nature , vol.422 , pp. 50-53
    • Hilgenkamp, H.1
  • 14
    • 0034712032 scopus 로고    scopus 로고
    • Room temperature magnetic quantum cellular automata
    • Cowburn, R. P. & Welland, M. E. Room temperature magnetic quantum cellular automata. Science 287, 1466-1468 (2000).
    • (2000) Science , vol.287 , pp. 1466-1468
    • Cowburn, R.P.1    Welland, M.E.2
  • 15
    • 0037094812 scopus 로고    scopus 로고
    • Magnetic behaviour of lithographically patterned particle arrays
    • invited
    • Ross, C. A. et al. Magnetic behaviour of lithographically patterned particle arrays (invited). J. Appl. Phys. 91, 6848-6853 (2002).
    • (2002) J. Appl. Phys. , vol.91 , pp. 6848-6853
    • Ross, C.A.1
  • 16
    • 0036496959 scopus 로고    scopus 로고
    • Probing antiferromagnetic coupling between nanomagnets
    • Cowburn, R. P. Probing antiferromagnetic coupling between nanomagnets. Phys. Rev. B 65, 092409 (2002).
    • (2002) Phys. Rev. B , vol.65 , pp. 092409
    • Cowburn, R.P.1
  • 19
    • 0031702616 scopus 로고    scopus 로고
    • Frustration and finite size effects of magnetic dot arrays
    • Stamps, R. L. & Camley, R. E. Frustration and finite size effects of magnetic dot arrays. J. Magn. Magn. Mater. 177, 813-814 (1998).
    • (1998) J. Magn. Magn. Mater. , vol.177 , pp. 813-814
    • Stamps, R.L.1    Camley, R.E.2
  • 20
    • 84945498711 scopus 로고    scopus 로고
    • The Object Oriented MicroMagnetic Framework (OOMMF) project at ITL/NIST
    • The Object Oriented MicroMagnetic Framework (OOMMF) project at ITL/NIST. 〈http://math.nist.gov/oommf/〉 (2005).
    • (2005)
  • 22
    • 0035817125 scopus 로고    scopus 로고
    • Long-range order at low temperatures in dipolar spin ice
    • Melko, R. G., den Hertog, B. C. & Gingras, M. J. P. Long-range order at low temperatures in dipolar spin ice. Phys. Rev. Lett. 87, 067203 (2001).
    • (2001) Phys. Rev. Lett. , vol.87 , pp. 067203
    • Melko, R.G.1    Den Hertog, B.C.2    Gingras, M.J.P.3
  • 23
    • 0034299332 scopus 로고    scopus 로고
    • Field induced ordering in highly frustrated antiferromagnets
    • Zhitomirsky, M. E., Honecker, A. & Petrenko, O. A. Field induced ordering in highly frustrated antiferromagnets. Phys. Rev. Lett. 85, 3269-3272 (2001).
    • (2001) Phys. Rev. Lett. , vol.85 , pp. 3269-3272
    • Zhitomirsky, M.E.1    Honecker, A.2    Petrenko, O.A.3
  • 24
    • 0942267517 scopus 로고    scopus 로고
    • Fabrication of sub-50 nm critical feature for magnetic recording device using electron-beam lithography
    • Yang, X. M. et al. Fabrication of sub-50 nm critical feature for magnetic recording device using electron-beam lithography. J. Vac. Sci. Technol. B 21, 3017-3020 (2003).
    • (2003) J. Vac. Sci. Technol. B , vol.21 , pp. 3017-3020
    • Yang, X.M.1
  • 25
    • 4944248150 scopus 로고    scopus 로고
    • Single step electron-beam lithography for asymmetric recess and gamma gate in high electron mobility transistor fabrication
    • Lin, C. K., Wang, W., Hwu, H. & Chan, Y. Single step electron-beam lithography for asymmetric recess and gamma gate in high electron mobility transistor fabrication. J. Vac. Sci. Technol. B. 22, 1723-1726 (2004).
    • (2004) J. Vac. Sci. Technol. B. , vol.22 , pp. 1723-1726
    • Lin, C.K.1    Wang, W.2    Hwu, H.3    Chan, Y.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.