Dynamic control of substrate bias for highly c -axis textured thin ferromagnetic CoCrTa film in inductively coupled plasma-assisted sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 1, 2005, Pages 39-43

  Okimura, Kunio ^a   Oyanagi, Junya ^a  

^a TOKAI UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COBALT COMPOUNDS; COERCIVE FORCE; INDUCTIVELY COUPLED PLASMA; MAGNETIC RECORDING; SPUTTER DEPOSITION; SURFACE CHEMISTRY; THIN FILMS;

DYNAMIC CONTROL; SUBSTRATE BIAS;

FERROMAGNETIC MATERIALS;

EID: 31144450494     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1827626     Document Type: Article

References (10)

1. S. Iwasaki and Y. Nakamura, IEEE Trans. Magn. 13, 1272 (1977).
2. S. Iwasaki and K. Ouchi, IEEE Trans. Magn. 14, 849 (1978).
3. T. P. Nolan, Y. Hirayama, and M. Futamoto, J. Appl. Phys. 79, 5359 (1996).
4. M. Naoe and S. Kadokura, J. Magn. Magn. Mater. 193, 185 (1999).
5. S. Hirono, Y. Koshimoto, S. Umemura, M. Igarashi, and Y. Maeda, IEEE Trans. Magn. 32, 4013 (1996).
6. T. Keitoku, T. Suzuki, J. Ariake, N. Honda, and K. Ouchi, J. Magn. Soc. Jpn. 26, 201 (2002) (in Japanese).
7. S. Nakagawa and S. H. Kong, J. Magn. Soc. Jpn. 27, 1097 (2003) (in Japanese).
8. K. Okimura and K. Yamauchi, Jpn. J. Appl. Phys., Part 1 42, 3641 (2003).
9. K. Okimura and J. Oyanagi, J. Vac. Sci. Technol. A 22, 39 (2004).
10. S. M. Rossnagel and J. Hopwood, Appl. Phys. Lett. 63, 3285 (1993).