Control of the compositionally separated microstructure of co-cr films prepared by electron cyclotron resonance plasma sputtering

IEEE Transactions on Magnetics

Volumn 32, Issue 5 PART 1, 1996, Pages 4013-4015

  Hirono, S ^a   Koshimoto, Y ^a   Umemura, S ^a   Igarashi, M ^a   Maeda, Y ^a  

^a NTT CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COBALT ALLOYS; ELECTRON CYCLOTRON RESONANCE; ETCHING; FILM PREPARATION; GRAIN GROWTH; MAGNETIC PROPERTIES; MAGNETIC RECORDING; MICROSTRUCTURE; PLASMA APPLICATIONS; SCANNING ELECTRON MICROSCOPY; SPURIOUS SIGNAL NOISE; SPUTTERING;

COMPOSITIONAL SEPARATION; ELECTRON CYCLOTRON RESONANCE PLASMA SPUTTERING; MAGNETIC ISOLATION; MAGNETIC MICROSTRUCTURE;

MAGNETIC THIN FILMS;

EID: 0030247511     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/20.539248     Document Type: Article

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