Formation of aluminium oxide film on Al substrate by micro-arc-technology at alternating-current power source

Journal of the Ceramic Society of Japan

Volumn 113, Issue 1323, 2005, Pages 743-748

  Takahashi, Norimitsu ^a   Funasaka, Hidenori ^a   Yonemoto, Yurika ^a   Shimizu, Tadao ^a  

^a CHIBA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Discharge; Electrolytic aqueous solution; Half wave rectification; Micro arc; Oxide film; Surface processing

Indexed keywords

ALUMINA; ELECTRIC DISCHARGES; ELECTROLYSIS; OXIDATION; SURFACE REACTIONS; THIN FILMS;

ELECTROLYTIC AQUEOUS SOLUTION; HALF-WAVE RECTIFICATION; MICRO-ARC; OXIDE FILMS; SURFACE PROCESSING;

CRYSTALLINE MATERIALS;

EID: 31144436290     PISSN: 09145400     EISSN: 13486535     Source Type: Journal    
DOI: 10.2109/jcersj.113.743     Document Type: Article

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