Effect of current density on the film thickness and structure of anodic barrier films formed on aluminum at low voltage region

Electrochemistry

Volumn 73, Issue 2, 2005, Pages 145-149

  Wada, Chieko ^a   Asoh, Hidetaka ^a   Ono, Sachiko ^a  

^a KOGAKUIN UNIVERSITY   (Japan)

Author keywords

Anodic Film; Film Thickness; IR drop; Low Voltage Region

Indexed keywords

ALUMINUM; ANODIC OXIDATION; CURRENT DENSITY; ELECTRIC CURRENTS; ELECTRIC POTENTIAL; SOLUTIONS;

ANODIC FILMS; FILM THICKNESS; IR-DROP; LOW VOLTAGE REGION;

FILMS;

EID: 16244414593     PISSN: 13443542     EISSN: None     Source Type: Journal    
DOI: 10.5796/electrochemistry.73.145     Document Type: Article

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