Self-assembly of nitroxide radicals via halogen bonding-directional NO .·I interactions

Tetrahedron Letters

Volumn 47, Issue 8, 2006, Pages 1249-1252

  Boubekeur, Kamal ^a   Syssa Magalé, Jean Laurent ^b,d   Palvadeau, Pierre ^c   Schöllhorn, Bernd ^b  

^a SORBONNE UNIVERSITÉ   (France)

^b ECOLE NORMALE SUPÉRIEURE   (France)

^c INSTITUT DES MATÉRIAUX JEAN ROUXEL   (France)

^d Universitee de Bangui   (South Africa)

Author keywords

Halogen bonding; Nitroxide radicals; Self assembly; Supramolecular chemistry

Indexed keywords

1,4 DIIODOTETRAFLUOROBENZE; 4 AMINO 2,2,6,6 TETRAMETHYLPIPERIDINE 1 YLOXYL RADICAL; 4 PHENYL 2,2,5,5 TETRAMETHYL 3 IMIDAZOLIN 2 YLOXYL RADICAL; BENZENE DERIVATIVE; FREE RADICAL; NITROXIDE; POLYMER; UNCLASSIFIED DRUG;

ARTICLE; CHEMICAL BINDING; CHEMICAL INTERACTION; CRYSTAL STRUCTURE; ELECTRON TRANSPORT; SUPRAMOLECULAR CHEMISTRY; SYNTHESIS; X RAY ANALYSIS;

EID: 31044453719     PISSN: 00404039     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tetlet.2005.12.088     Document Type: Article

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