Formation of chalcogen containing plasmas and their use in the synthesis of photovoltaic absorbers

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 4, 2005, Pages 1202-1207

  Kosaraju, S ^a   Repins, I ^b   Wolden, C A ^a  

^a Department of Metallurgical and Materials Engineering   (United States)

^b ITN Energy Systems   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON PLASMA; CHALCOGEN; PLASMA PROCESSING;

ARGON; HYDROGEN SULFIDE; INDIUM; PHOTOVOLTAIC CELLS; SCANNING ELECTRON MICROSCOPY; SELENIUM; SYNTHESIS (CHEMICAL); TEMPERATURE DISTRIBUTION; THIN FILMS; VAPORS; X RAY DIFFRACTION ANALYSIS;

INDUCTIVELY COUPLED PLASMA;

EID: 31044444120     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1924471     Document Type: Conference Paper

References (23)

1. J. H. L. Stolt, J. Kessler, M. Ruckh, K.-O. Velthaus, and H.-W. Schock, Appl. Phys. Lett. 62, 597 (1993).
2. M. Marudachalam, H. Hichri, R. Klenk, R. W. Birkmire, W. N. Shafarman, and J. M. Schultz, Appl. Phys. Lett. 67, 3978 (1995).
3. K. Ramanathan, M. A. Contreras, C. L. Perkins, S. Asher, F. S. Hasoon, J. Keane, D. Young, M. Romero, W. Metzger, R. Noufi, J. Ward, and A. Duda, Prog. Photovoltaics 11, 225 (2003).
4. H. J. Lewerenz, Sol. Energy Mater. Sol. Cells 83, 395 (2004).
5. A. Antony, A. S. Asha, R. Yoosuf, R. Manoj, and M. K. Jayaraj, Sol. Energy Mater. Sol. Cells 81, 407 (2004).
6. K. Siemer, J. Klaer, I. Luck, J. Bruns, R. Klenk, and D. Bräunig, Sol. Energy Mater. Sol. Cells 67, 159 (2001).
7. L. Stolt, J. Hedström, J. Kessler, M. Ruckh, K.-O. Velthaus, and H.-W. Schock, Appl. Phys. Lett. 62, 597 (1993).
8. M. Gossla, H. Metzner, and H. E. Mahnke, Thin Solid Films 387, 77 (2001).
9. M. Murudachalam, R. W. Birkmire, H. Hichri, J. M. Schultz, A. Swartzlander, and M. M. Al-Jassim, J. Appl. Phys. 82, 2896 (1997).
10. R. Scheer, T. Walter, H. W. Schock, M. L. Fearheiley, and H. J. Lewerenz, Appl. Phys. Lett. 63, 3294 (1993).
11. S. T. Lakshmikumar and A. C. Rastogi, J. Appl. Phys. 76, 3068 (1994).
12. G. Lippold, H. Neumann, and A. Schindler, Mater. Res. Soc. Symp. Proc. 668, H39.1 (2001).
13. S. Kosaraju, I. Repins, and C. A. Wolden, Mater. Res. Soc. Symp. Proc. 763, B8.19 (2003).
14. CRC Handbook of Chemistry and Physics, 78th ed. (CRC Press, Boca Raton, FL, 1997).
15. E. Meeks, R. S. Larson, P. Ho, C. Apblett, S. M. Han, E. Edelberg, and E. S. Aydil, J. Vac. Sci. Technol. A 16, 544 (1998).
16. M. V. Malyshev and V. M. Donnelly, J. Appl. Phys. 87, 1642 (2000).
17. K. Kileen, K. Greenberg, and J. T. Verdeyen, Appl. Phys. Lett. 40, 36 (1982).
18. J. Berkowitz and J. R. Marquart, J. Chem. Phys. 39, 275 (1963).
19. R. A. Zingaro and W. C. Cooper, Selenium (Van Nostrand Reinhold, New York, 1974), p. 88.
20. C. A. Wolden, S. Mitra, and K. K. Gleason, J. Appl. Phys. 72, 3750 (1992).
21. J. I. Pankove, Optical Processes in Semiconductors (Prentice Hall, Englewood Cliffs, N.J., 1972).
22. N. Barreau, S. Marsillac, J. C. Berne'de, T. B. Nasrallah, and S. Belgacem, Phys. Status Solidi A 184, 179 (2001).
23. T. Walter and H. W. Schock, Thin Solid Films 224, 74 (1993).