Preferred-orientation effects on the ferromagnetic properties of La 1-xSrxMnO3 films deposited on Si substrates

Electrochemical and Solid-State Letters

Volumn 9, Issue 3, 2006, Pages

  Chen, Yen Hua ^a   Lo, Yun Shan ^a   Wu, Tai Bor ^a   Chang, Fong Chi ^a   Chi, Cheng Chung ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTRIC INSULATORS; FERROMAGNETISM; MAGNETIZATION; OXYGEN; SILICON; TENSILE STRESS; THERMAL STRESS;

FERROMAGNETIC TRANSITION; LA1-X SRX MNO3 (LSMO); OXYGEN DEFICIENCY; SI SUBSTRATES;

THIN FILMS;

EID: 31044441974     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2165712     Document Type: Article

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