Atomistic modeling of diffusion in the TiAl compound

Defect and Diffusion Forum

Volumn 237-240, Issue PART 1, 2005, Pages 271-276

  Mishin, Y ^a   Belova, I V ^b   Murch, G E ^b  

^a George Mason University   (United States)

^b UNIVERSITY OF NEWCASTLE   (Australia)

Author keywords

Atomistic modeling; Correlation factor; Diffusion rate constants; Embedded atom method; Kinetic Monte Carlo method; Molecular dynamics; Self diffusion

Indexed keywords

CONCENTRATION (PROCESS); HARMONIC GENERATION; INTERMETALLICS; MATHEMATICAL MODELS; MOLECULAR DYNAMICS; MONTE CARLO METHODS; TITANIUM COMPOUNDS;

ATOMISTIC MODELING; CORRELATION FACTOR; SELF-DIFFUSION;

DIFFUSION;

EID: 30744449267     PISSN: 10120386     EISSN: 16629507     Source Type: Journal    
DOI: 10.4028/www.scientific.net/ddf.237-240.271     Document Type: Conference Paper

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