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Volumn 867, Issue , 2005, Pages 47-52

Role of molecular structure of complexing/chelating agents in copper CMP slurries

Author keywords

[No Author keywords available]

Indexed keywords

ALKALINITY; AMINES; AMINO ACIDS; COPPER; PH EFFECTS; SLURRIES;

EID: 30544448293     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-867-w1.11     Document Type: Conference Paper
Times cited : (11)

References (16)
  • 2
    • 0035559023 scopus 로고    scopus 로고
    • Chemical-mechanical polishing: Advances and future challenges
    • Chemical-Mechanical Polishing: Advances and Future Challenges, MRS Spring Meeting Proceedings, Vol. 671, S. V. Babu, K. C. Cadien and H. Yano, Eds (2001)
    • (2001) MRS Spring Meeting Proceedings , vol.671
    • Babu, S.V.1    Cadien, K.C.2    Yano, H.3
  • 9
    • 30544437828 scopus 로고    scopus 로고
    • PhD. Thesis, Clarkson University
    • V. Gorantla, PhD. Thesis, Clarkson University, 2004.
    • (2004)
    • Gorantla, V.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.