Electrodeposition and corrosion behaviour of a Ni-W-B amorphous alloy

Journal of Applied Electrochemistry

Volumn 36, Issue 1, 2006, Pages 105-113

  Santana, R A C ^a   Prasad, S ^a   Campos, A R N ^a   Araujo F O ^a   Da Silva, G P ^b   De Lima Neto, P ^b  

^a FEDERAL UNIVERSITY OF CAMPINA GRANDE   (Brazil)

^b FEDERAL UNIVERSITY OF CEARÁ   (Brazil)

Author keywords

Alloy electrodeposition; Amorphous structures; Corrosion; Electrodeposited films; Ni W B alloy

Indexed keywords

AMMONIA; CATHODES; CORROSION RESISTANCE; CURRENT DENSITY; ELECTRODEPOSITION; MICROCRACKS; NICKEL ALLOYS; PH EFFECTS;

ALLOY ELECTRODEPOSITION; AMORPHOUS STRUCTURES; ELECTRODEPOSITED FILMS; NI-W-B ALLOY;

AMORPHOUS ALLOYS;

EID: 30444438207     PISSN: 0021891X     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10800-005-9046-2     Document Type: Article

References (21)

1. R.A.C. Santana, S. Prasad and F.S.M. Santana, Eclética Química. 28 (2003) 69.
2. S.M. Mayanna, N. Nunichandraiah and T. Mimani, J. Appl. Electrochem. 23 (1993) 339.
3. A.T. Wasko, Electrochemistry of Tungsten and Molybdenum (Naukova dumka, Kiev, 1977).
4. A. Brenner, Electrodeposition of Alloy, vol. 2 (Academic Press, New York, 1963), pp. 589.
5. B.N. Maruthi, L. Ramesh, S.M. Mayanna and D. Landolt, Plating Surf. Finish. 86 (1999) 85.
6. S. Prasad, F.S.M. Santana and F.A. Marinho, Braz. J. Chem. Eng. 17 (2000) 423.
7. S. Eskin, O. Berkh, G. Rogalsky and J. Zahavi, Plating Surf. Finish. 85 (1998) 79.
8. M. Donten and Z. Stojek, J. Appl. Electrochem, 26 (1996) 665.
9. C. Gangmin, Y. Fangzu, H. Ling, N. Zhenjiang, X. Shukai and Z. Shaomin, Trans. IMF 79(2) (2001) 81.
10. J. Kramer, J. Annln. Phys. 19 (1934) 37.
11. A. Brenner, D.E. Couch and E.K. Williams, J. Res. Natl. Bur. Standards 44 (1950) 109.
12. F.A. Marinho, F.S.M. Santana, A.L.S. Vasconcelos, R.A.C. Santana and S. Prasad, J. Braz. Chem. Soc. 13 (2002) 522.
13. U. Admon and M.P. Dariel, J. Appl. Phys. 59(6) (1986) 2002.
14. P. Schloßmacher and T. Yamsaki, Mikrochim. Ada 132 (2000) 309.
15. L.A.M. Ruotolo and J.C. Gubulin, J. Appl. Electrochem. 33 (2003) 1217.
16. O. Younes and E. Gileadi, Electrochim. Acta 48 (2003) 2551.
17. F-Z. Yang, Y-F. Guo, L. Hung, S-K. Xu and S-M. Zhou, Chinese J. Chem. 22 (2004) 228.
18. M. Donten, H. Cesiulis and Z. Stojek, Electrochim. Acta 45 (2000) 3389.
19. W. Wikiel and J. Osteryoung, J, Appl. Electrochem. 22 (1992) 506.
20. M. Keddam, O.R. Mattos and H.J. Takenouri, J. Electrochem. Soc. 128 (1981) 257.
21. M. Keddam, J.F. Lizee, C. Pallotta and H.J. Takenouri, J. Electrochem. Soc. 131 (1984) 2016.