Stress distributions in growing polycrystalline oxide films

Acta Materialia

Volumn 52, Issue 13, 2004, Pages 3761-3780

  Krishnamurthy, R ^a   Srolovitz, D J ^a  

^a Princeton University   (United States)

Author keywords

Grain boundaries; Modelling; Oxidation; Residual stresses; Theory

Indexed keywords

DEFECTS; DIFFUSION; DISLOCATIONS (CRYSTALS); GRAIN BOUNDARIES; PIEZOELECTRIC DEVICES; PLASTIC DEFORMATION; POLYCRYSTALLINE MATERIALS; POSITIVE IONS; REACTION KINETICS; RESIDUAL STRESSES; STRESS ANALYSIS; SUBSTRATES; THERMODYNAMIC PROPERTIES; X RAY DIFFRACTION;

MODELLING; PIEZOSPECTROSCOPIC TECHNIQUES; POLYCRYSTALLINE OXIDE FILMS; TENSILE STRESSES;

OXIDATION;

EID: 3042800750     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.actamat.2004.04.036     Document Type: Article

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