Comparison of photoelectrode properties between TiO2 thin films doped with tantalum and dispersed with nanosize gold

Electrochemical and Solid-State Letters

Volumn 7, Issue 7, 2004, Pages

  Yoon, Jong Won ^a   Sasaki, Takeshi ^a   Koshizaki, Naoto ^a   Noguchi, Yuji ^b   Miyayama, Masaru ^b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b INSTITUTE OF INDUSTRIAL SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DOPING (ADDITIVES); ELECTRODES; GOLD; NANOSTRUCTURED MATERIALS; PHOTOCURRENTS; SCANNING ELECTRON MICROSCOPY; SPUTTERING; TITANIUM DIOXIDE; ULTRAVIOLET RADIATION; X RAY DIFFRACTION ANALYSIS;

ANATASES PHASES; NANOCOMPOSITE THIN FILMS; PHOTOELECTRODES; PHOTORESPONSES;

THIN FILMS;

EID: 3042790219     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1737712     Document Type: Article

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