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Volumn 92, Issue 1, 2004, Pages 72-78

Residual methyl methacrylate monomer, water sorption, and water solubility of hypoallergenic denture base materials

Author keywords

[No Author keywords available]

Indexed keywords

METHACRYLIC ACID METHYL ESTER; RESIN;

EID: 3042755689     PISSN: 00223913     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.prosdent.2004.04.003     Document Type: Article
Times cited : (104)

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