Design of 193 nm optical thin films under practical structure and optical parameters

Zhongguo Jiguang/Chinese Journal of Lasers

Volumn 31, Issue 4, 2004, Pages 477-481

  Yuan, Jing Mei ^a   Yi, Kui ^a   Qi, Hong Ji ^a   Fan, Zheng Xiu ^a   Shao, Jian Da ^a  

^a INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

Author keywords

193 nm optical thin film; Absorption of water; Extinction coefficient; Microlithography; Surface roughness; Thin film technique

Indexed keywords

LIGHT EXTINCTION; LIGHT REFLECTION; LITHOGRAPHY; NUMERICAL METHODS; OPTICAL DESIGN; OPTICAL PROPERTIES; SURFACE ROUGHNESS;

EXTINCTION COEFFICIENT; MICROLITHOGRAPHY; OPTICAL THIN FILM; THIN FILM TECHNIQUE;

OPTICAL FILMS;

EID: 3042723712     PISSN: 02587025     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (8)

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