New fabrication process for high-performance silicon condenser microphone with monocrystalline silicon diaphragm and backplate

Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2004, Pages 601-604

  Iguchi, Yoshinori ^a   Tajima, Toshifumi ^a   Goto, Masahide ^a   Iwaki, Masakazu ^a   Ando, Akio ^a   Tanioka, Kenkichi ^a   Takeshi, Futoshi ^b   Matsunaga, Susumu ^b   Yasuno, Yoshinobu ^b  

^a NHK SCIENCE AND TECHNICAL RESEARCH LABORATORIES   (Japan)

^b Panasonic SC Device Solutions CL ^*  (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BOROSILICATE GLASS; CAPACITORS; CRYSTALLINE MATERIALS; ELECTRIC FREQUENCY CONTROL; ETCHING; MICROPROCESSOR CHIPS; PHOTOLITHOGRAPHY; SENSITIVITY ANALYSIS; SILICON; VOLTAGE CONTROL;

BIAS VOLTAGES; MONOCRYSTALLINE SILICON; SILICON CONDENSER MICROPHONES; WET ETCHING;

MICROPHONES;

EID: 3042696953     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)

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