Broad beam low-energy ion source for ion-beam assisted deposition and material processing

Review of Scientific Instruments

Volumn 75, Issue 5 PART II, 2004, Pages 1934-1936

  Kotov, D A ^a  

^a BELARUSIAN STATE UNIVERSITY OF INFORMATICS AND RADIOELECTRONICS   (Belarus)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; COATING TECHNIQUES; ELECTRIC POTENTIAL; ELECTROSTATICS; ETCHING; FARADAY EFFECT; ION BEAM ASSISTED DEPOSITION; ION BOMBARDMENT; MAGNETIC FIELD EFFECTS; STRESS ANALYSIS; THIN FILMS;

CLOSE-DRIFT ION ACCELERATION; DOUBLE-ANODE ION SOURCES; GRIDDED KAUFMAN SOURCES; MATERIAL PROCESSING;

ION SOURCES;

EID: 3042660280     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1702109     Document Type: Conference Paper

References (8)

1. W. Ensinger, Rev. Sci. Instrum. 63, 5217 (1992).
2. T. Takagi, Nucl. Instrum. Methods Phys. Res. B 37/38, 1 (1989).
3. B. W. Dodson, Nucl. Instrum. Methods Phys. Res. B 59/60, 481 (1991).
4. N. Vershinin, R. Dimitrou, M. Benmalek, B. Straumal, W. Gust, J. Vival, and J. Shulga, Surf. Coat. Technol. 125, 35 (2000).
5. J. M. Harper, J. J. Cuomo, and H. R. Kaufman, J. Vac. Sci. Technol. 21, 737 (1982).
6. H. R. Kaufman, R. S. Robinson, and R. I. Seddon, J. Vac. Sci. Technol. A 5, 2081 (1987).
7. I. V. Svadkovski and A. P. Dostanko, Mater. Res. Soc. Symp. Proc. 369, 635 (1995).
8. C. Lejeune, J. Grandchamp, and O. Kessi, Vacuum 36, 857 (1986).