Pre-treatment of large area strips with the aid of a high power Hall current accelerator

Surface and Coatings Technology

Volumn 125, Issue 1-3, 2000, Pages 35-39

  Vershinin, N ^a,b   Dimitriou, R ^c   Benmalek, M ^c   Straumal, B ^b,d   Gust, W ^d   Vivas, J ^e   Shulga, J ^f  

^a SONG Ltd   (Russian Federation)

^b IVT Ltd   (Russian Federation)

^c ALCAN INTERNATIONAL LIMITED   (Canada)

^d Institut fur Metallkunde   (Germany)

^e UNIVERSIDAD NACIONAL DEL COMAHUE   (Argentina)

^f SEMENOV INSTITUTE OF CHEMICAL PHYSICS   (Russian Federation)

Author keywords

Hall current accelerator; Ionic etching; Kaufman source; Sputter cleaning

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CURRENT VOLTAGE CHARACTERISTICS; GLASS; ION BEAMS; POLYMETHYL METHACRYLATES; SPUTTER DEPOSITION; SURFACE CLEANING;

HALL CURRENT ACCELERATOR; KAUFMAN SOURCE; SPUTTER CLEANING;

PROTECTIVE COATINGS;

EID: 0033874604     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00601-5     Document Type: Article

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