Material modifications induced by laser annealing in two-dimensional structures

Applied Physics Letters

Volumn 84, Issue 23, 2004, Pages 4738-4740

  La Magna, Antonino ^a   Alippi, Paola ^a   Privitera, Vittorio ^a   Scalese, Silvia ^a   Pannitteri, Salvatore ^a   Fortunato, Guglielmo ^b   Mariucci, Luigi ^b   Camalleri, Marco ^c  

^a CNR IMM   (Italy)

^b IFN CNR   (Italy)

^c STMICROELECTRONICS   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ANNEALING; COMPUTER SIMULATION; CRYSTALLINE MATERIALS; DOPING (ADDITIVES); FINITE ELEMENT METHOD; LASER BEAM EFFECTS; MATHEMATICAL MODELS; MELTING; PHASE INTERFACES; SILICA; TRANSMISSION ELECTRON MICROSCOPY;

DELINEATION; LASER ANNEALING; METAL-OXIDE SEMICONDUCTOR STRUCTURES; PHASE-FIELD METHODS;

MOS DEVICES;

EID: 3042543293     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1759772     Document Type: Article

References (7)

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