Systematic structural characterization of the high-temperature behavior of nearly stoichiometric silicon oxycarbide glasses

Chemistry of Materials

Volumn 16, Issue 13, 2004, Pages 2585-2598

  Brequel H ^a   Parmentier, J ^b   Walter, S ^b   Badheka, R ^c   Trimmel, G ^c   Masse, S ^c   Latournerie, J ^d   Dempsey, P ^d   Turquat, C ^e   Desmartin Chomel, A ^f   Le Neindre Prum, L ^g   Jayasooriya, U A ^f   Hourlier, D ^d   Kleebe, H J ^e   Soraru G D ^b   Enzo, S ^a   Babonneau, F ^c,h  

^a UNIVERSITY OF SASSARI   (Italy)

^b UNIVERSITY OF TRENTO   (Italy)

^c SORBONNE UNIVERSITÉ   (France)

^d UNIVERSITY OF LIMOGES   (France)

^e UNIVERSITY OF BAYREUTH   (Germany)

^f UNIVERSITY OF EAST ANGLIA   (United Kingdom)

^g belChem ^*  (Germany)

^h UNIVERSITÉ PIERRE ET MARIE CURIE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COMPOSITION; GLASS; MICROSTRUCTURE; NEUTRON SCATTERING; PYROLYSIS; SOL-GELS; STOICHIOMETRY;

INERT ATMOSPHERE; SILICON OXYCARBIDE GLASSES;

SILICON CARBIDE;

GLASS; SILICON DERIVATIVE; SILICON OXYCARBIDE; SILOXANE; UNCLASSIFIED DRUG;

ADSORPTION; ARTICLE; CHEMICAL BOND; DESORPTION; ELECTRON DIFFRACTION; GEL; HIGH TEMPERATURE; INFRARED SPECTROSCOPY; NEUTRON DIFFRACTION; NEUTRON SCATTERING; POROSITY; PROTON NUCLEAR MAGNETIC RESONANCE; PYROLYSIS; QUANTITATIVE ANALYSIS; RADIATION SCATTERING; RAMAN SPECTROMETRY; STOICHIOMETRY; STRUCTURE ANALYSIS; SYNTHESIS; TRANSMISSION ELECTRON MICROSCOPY;

EID: 3042533408     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm049847a     Document Type: Article

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