Electrochemical study of indium in a water-stable 1-ethyl-3- methylimidazolium chloride/tetrafluoroborate room temperature ionic liquid

Journal of the Chinese Chemical Society

Volumn 51, Issue 2, 2004, Pages 253-260

  Yang, Ming Huan ^a   Sun, I Wen ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Electrochemistry; Electrodeposition; Indium; Ionic liquid; Tetrafluoroborate

Indexed keywords

1 ETHYL 3 METHYLIMIDAZOLIUM CHLORIDE; BORIC ACID; CARBON; GLASS; IMIDAZOLE DERIVATIVE; INDIUM; INDIUM CHLORIDE; ION; NICKEL; TETRAFLUOROBORATE; TUNGSTEN; UNCLASSIFIED DRUG; WATER;

AMPEROMETRY; ARTICLE; COMPLEX FORMATION; CRYSTAL; DIFFUSION; DISSOLUTION; ELECTROCHEMICAL ANALYSIS; ELECTROCHEMISTRY; ELECTRODE; LIQUID; REDUCTION; ROOM TEMPERATURE; SCANNING ELECTRON MICROSCOPE; TEMPERATURE DEPENDENCE; TITRIMETRY; X RAY DIFFRACTION;

EID: 3042513820     PISSN: 00094536     EISSN: None     Source Type: Journal    
DOI: 10.1002/jccs.200400040     Document Type: Article

References (18)

1. Wilkes, J. S.; Levisky, J. A.; Wilson, R. A.; Hussey, C. L. Inorg. Chem. 1982, 21, 1263.
2. Earl, M. J.; Seddon, K. R. Pure Appl. Chem. 2000, 72, 1391.
3. Hussey, C. L.; Mamantov, G. In Chemistry of Nonaqueous Solutions Current Progress; Popov, A. I., Eds., VCH; New York, 1994; p 227.
4. Carlin, R. T.; Wilkes, J. S.; Mamantov, G. In Chemistry of Nonaqueous Solutions Current Progress; Popov, A. I., Eds.; VCH; New York, 1994; p 277.
5. (a) Stafford, G. R.; Hussey, C. L.; Alkire, R. C. In Advances in Electrochemical Science and Engineering; Kolb, D. M., Eds.; Wiley-VCH; 2001; Vol. 7, p 275.
6. (b) Welton, T. Chem. Rev. 1999, 99, 2071.
7. Sun, I.-W.; Wu, S.-Y.; Su, C.-H.; Shu, Y.-L; Wu, P.-L. J. Chin. Chem. Soc. 2003, accepted.
8. Wilkes, J. S.; Zaworotko, M. J. J. Chem. Soc. Chem. Commum. 1992, 965.
9. Cooper, E. I.; O'Sullivan, E. J. M.; Gale, R. J.; Blomgren, G. In Molten Salts; Kojima, H., Eds; PV 92-16, The Electrochemical Society Proceedings Series, Pennington: N.J., 1992; p 386.
10. (a) Lin, Y.-F.; Sun, I.-W. Electrochim. Acta 1999, 44, 2771.
11. (b) Hsiu, S.-I; Huang, J.-F.; Sun, I-W. Electrochim. Acta 2002, 47, 4367.
12. Chen, P.-Y.; Sun, I.-W. Electrochim. Acta 1999, 45, 441.
13. Chen, P.-Y.; Sun, I.-W. Electrochim. Acta 2000, 45, 3163.
14. Brenner, A. Electrodeposition of Alloys, Principles and Practice; Academic: New York, 1963; p 547.
15. (a) Carpenter, M. K.; Verbrugge, M. W. J. Mater. Res. 1994, 9, 2584.
16. (b) Carpenter, M. K.; Verbrugge, M. W. US patent 92-926103, 1994.
17. Noel, M. A. M.; Osteryoung, R. A. J. Electroanal. Chem. 1990, 284, 413.
18. Vargas, T.; Varma, R. In Techniques for Characterization of Electrodes and Electrochemical Processes; Varma, R.; Selman, J. R., Eds.; John Wiley & Sons: New York, 1991; Chapter 5.