Gas phase reaction between MCl4 and NH3: Monomers or oligomers?

Phosphorus, Sulfur and Silicon and the Related Elements

Volumn 179, Issue 4-5, 2004, Pages 953-954

  Davydova, E I ^a   Timoshkin, A Y ^a   Sevastianova, T N ^a   Suvorov, A V ^a   Frenking, G ^b  

^a ST PETERSBURG STATE UNIVERSITY   (Russian Federation)

^b PHILIPPS UNIVERSITY MARBURG   (Germany)

Author keywords

Cl2SiNH oligomers; DFT calculations; Nitride films

Indexed keywords

GERMANIUM DERIVATIVE; MONOMER; OLIGOMER; SILICON DERIVATIVE; TIN;

CHEMICAL REACTION; CONFERENCE PAPER; ENTROPY; GAS; HIGH TEMPERATURE PROCEDURES; SYNTHESIS;

EID: 3042513721     PISSN: 10426507     EISSN: None     Source Type: Journal    
DOI: 10.1080/10426500490429013     Document Type: Conference Paper

References (2)

1. S.-S. Lin, J. Electrochem. Soc., 125, 1877 (1978).
2. A. Y. Timoshkin, M. Siodmiak, A. A. Korkin, and G. Frenking, Computional Materials Science, 27, 109 (2003).