Control of photoresist film thickness: Iterative feedback tuning approach

Computers and Chemical Engineering

Volumn 30, Issue 3, 2006, Pages 572-579

  Tay, Arthur ^a   Khuen Ho, Weng ^a   Deng, Jiewen ^a   Keng Lok, Boon ^b  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b SINGAPORE INSTITUTE OF MANUFACTURING TECHNOLOGY   (Singapore)

Author keywords

Iterative feedback tuning; Microlithography; Photoresist processing; Self tuning control; Semiconductor manufacturing; Temperature control

Indexed keywords

FEEDBACK; INTEGRATED CIRCUITS; ITERATIVE METHODS; NANOSTRUCTURED MATERIALS; PHOTORESISTORS; TEMPERATURE CONTROL;

ITERATIVE FEEDBACK TUNING; PHOTORESIST PROCESSING; SELF-TUNING CONTROL; SEMICONDUCTOR MANUFACTURING;

LITHOGRAPHY;

CONTROL;

EID: 30344457043     PISSN: 00981354     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.compchemeng.2005.10.004     Document Type: Article

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