Compaction and rarefaction affect photolithography system lifetimes

Laser Focus World

Volumn 41, Issue 11, 2005, Pages 103-107

  Algots, J Martin ^a   Steinbrecher, Carl ^a   Chuckravenan, Soupaya ^a   Jinbo, Hiroki ^b  

^a CYMER INC   (United States)

^b NIKON CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

OPTICAL TESTS; PHOTOLITHOGRAPHY SYSTEMS; RAREFACTION AFFECTS; SCANNERS;

BANDWIDTH; DENSITY (OPTICAL); FUSED SILICA; LASER PULSES; LIGHT REFRACTION; LIGHT SOURCES;

PHOTOLITHOGRAPHY;

EID: 29744442798     PISSN: 10438092     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Review

References (5)

1. J M. Algots et al., Proc. SPIE 5040, 1639 (2003).
2. R. Sandstrom, Proc. 2nd Symp. on 193-nm Litho., Colorado Springs, CO (1997).
3. J. Moll, P. Dewa, Proc SPIE 4691, 1734 (2002).
4. J. M. Algots et al., Proc. SPIE 5377 (2004).
5. R. Morton et al., Proc SPIE 4000, 496 (2000).