Compaction and rarefaction of fused silica with 193-nm excimer laser exposure

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5040 III, Issue , 2003, Pages 1639-1650

  Algots, J Martin ^a   Sandstrom, Richard ^a   Partlo, William ^a   Maroevic, Petar ^a   Eva, Eric ^b   Gerhard, Michael ^b   Lindner, Ralf ^b   Stietz, Frank ^b  

^a CYMER INC   (United States)

^b CARL ZEISS SMT AG   (Germany)

Author keywords

ArF; Compaction; Excimer; Fused silica; Lithography; Pulse stretch; Rarefaction

Indexed keywords

COMPACTION; EXCIMER LASERS; FUSED SILICA; LASER OPTICS; LASER PULSES; PROJECTION SYSTEMS; WAVEFRONTS;

ENERGY DENSITY; OPTICAL DELAY LINE; PULSE STRETCH; RAREFACTION;

LITHOGRAPHY;

EID: 0141498202     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485530     Document Type: Conference Paper

References (7)

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3. N.F. Borrelli, et al, "Densification of fused silica under 193nm excitation," J. Opt. Soc. Am. B 14, 1606-1615, 1997.
4. R. Sandstrom, Proc of 2nd Symposium on 193nm Lithography, Colorado Springs, CO, 1997.
5. R. Morton, et al, "Behavior of Fused Silica Materials for Microlithography Irradiated at 193nm with low-fluence ArF Radiation for tens of Billions of Pulses," Proc SPIE 4000, pp 496-510, 2000.
6. J. Moll and P. Dewa, "Laser Resistance of Fused Silica for Microlithography: Experiments and Models," Proc SPIE 4691, pp 1734-1741, 2002.
7. D.C. Allan, C. Smith, N.F. Borelli, "Measurement and Analysis of compaction in fused silica", Symposium of Laser-Induced Damage in Optical Materials, Boulder, Colorado, 1998, pp 16-27.