Fabrication of nanometer scale magnetic tunnel junction arrays and their enhanced magnetoresistance

Journal of Applied Physics

Volumn 95, Issue 11 II, 2004, Pages 7249-7251

  Haraichi, Satoshi ^a   Wada, Toshimi ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COBALT; COULOMB BLOCKADE; ELECTRIC RESISTANCE; ELECTRODES; HIGH TEMPERATURE EFFECTS; MAGNETIC MATERIALS; MAGNETIZATION; MAGNETORESISTANCE; NICKEL; NICKEL COMPOUNDS; OZONE; SILICA;

BARRIER STRUCTURES; MAGNETIC TUNNELING JUNCTIONS (MTJ); ROOM TEMPERATURE (RT); TUNNELING MAGNETORESISTANCE (TMR);

TUNNEL JUNCTIONS;

EID: 2942694010     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1688675     Document Type: Conference Paper

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