Insertion of H+, Li+, Na+ and K + into thin films prepared from silicotungstic acid - A photoelectron spectroscopy study

Thin Solid Films

Volumn 461, Issue 2, 2004, Pages 237-242

  Henningsson, Anders ^a   Rensmo, Håkan ^a   Sandell, Anders ^a   Södergren, Sven ^b   Siegbahn, Hans ^a  

^a UPPSALA UNIVERSITY   (Sweden)

^b Gammadata Scienta AB   (Sweden)

Author keywords

Photoelectron spectroscopy; Silicotungstic acid; Tungsten oxide; W 4f

Indexed keywords

BINDING ENERGY; ELECTROCHEMISTRY; ELECTROCHROMISM; ELECTRONIC STRUCTURE; OXIDATION; PHOTOELECTRON SPECTROSCOPY; TUNGSTEN COMPOUNDS;

ION INSERTION; SILICOTUNGSTIC ACID; TUNGSTEN OXIDE; W 4F;

THIN FILMS;

EID: 2942670119     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.01.064     Document Type: Article

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