Electronic structure of electrochemically Li-inserted TiO2 studied with synchrotron radiation electron spectroscopies

Journal of Chemical Physics

Volumn 118, Issue 12, 2003, Pages 5607-5612

  Henningsson, Anders ^a   Rensmo, Håkan ^a   Sandell, Anders ^a   Siegbahn, Hans ^a   Södergren, Sven ^b   Lindström, Henrik ^a   Hagfeldt, Anders ^a  

^a UPPSALA UNIVERSITY   (Sweden)

^b Gammadata Scienta AB   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; ELECTROCHEMISTRY; ELECTRON SPECTROSCOPY; ELECTRONIC PROPERTIES; ELECTRONIC STRUCTURE; LITHIUM; PHOTOELECTRON SPECTROSCOPY; POSITIVE IONS; SYNCHROTRON RADIATION; X RAY ANALYSIS;

ELECTROCHEMICALLY LITHIUM INSERTED TITANIUM DIOXIDE; SYNCHROTRON RADIATION ELECTRON SPECTROSCOPIES; VALENCE BAND; VALENCE LEVEL; X RAY ABSORPTION SPECTROSCOPY;

TITANIUM DIOXIDE;

EID: 0037461043     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1545086     Document Type: Article

References (21)

1. S. Y. Huang, L. Kavan, I. Exnar, and M. Grätzel, J. Electrochem. Soc. 142, L142 (1995).
2. A. Hagfeldt, N. Vlachopoulos, and M. Grätzel, J. Electrochem. Soc. 141, L82 (1994).
3. B. O'Regan and M. Grätzel, Nature (London) 353, 737 (1991).
4. S. Södergren, H. Sietgbahn, H. Rensmo, H. Lindström, A. Hagfeldt, and S. E. Lindquist, J. Phys. Chem. B 101, 3087 (1997).
5. F. Bonino, L. Busani, M. Lazzari, M. Manstretta, B. Rivolta, and B. Scrosati, J. Power Sources 6, 261 (1981).
6. B. Zachau Christiansen, K. West, T. Jacobsen, and S. Atlung, Solid State Ionics 28, 1176 (1988).
7. A. Solbrand, H. Lindström, H. Rensmo, A. Hagfeldt, S. E. Lindquist, and S. Södergren, J. Phys. Chem. B 101, 2514 (1997).
8. L. Vayssieres (unpublished).
9. H. Lindström, S. Södergren, A. Solbrand, H. Rensmo, J. Hjelm, A. Hagfeldt, and S. E. Lindquist, J. Phys. Chem. B 101, 7710 (1997).
10. L. Kavan, K. Kratochvilova, and M. Grätzel, J. Electroanal. Chem. 394, 93 (1995).
11. V. E. Henrich and P. A. Cox, The Surface Science of Metal Oxides (Cambridge University Press, Cambridge, 1994).
12. R. Sanjines, H. Tang, H. Berger, F. Gozzo, G. Margaritondo, and F. Levy, J. Appl. Phys. 75, 2945 (1994).
13. F. M. F. de Groot, J. C. Fuggle, B. T. Thole, and G. A. Sawatzky, Phys. Rev. B 41, 928 (1990).
14. R. J. Cava, D. W. Murphy, S. Zahurak, A. Santoro, and R. S. Roth, J. Solid State Chem. 53, 64 (1984).
15. A. Henningsson, M. P. Andersson, P. Uvdal, H. Siegbahn, and A. Sandell, Chem. Phys. Lett. 360, 85 (2002).
16. A. Stashans, S. Lunell, R. Bergstrom, A. Hagfeldt, and S. E. Lindquist, Phys. Rev. B 53, 159 (1996).
17. J. J. Yeh, and I. Lindau, At. Data Nucl. Data Tables 32, 1 (1985).
18. H. Y. Wong, C. W. Ong, R. W. M. Kwok, K. W. Wong, S. P. Wong, and W. Y. Cheung, Thin Solid Films 376, 1 (2000).
19. R. Ruus, A. Kikas, A. Saar, A. Ausmees, E. Nommiste, J. Aarik, A. Aidla, T. Uustare, and I. Martinson, Solid State Commun. 104, 199 (1997).
20. M. Matsubara, T. Uozumi, A. Kotani, Y. Harada, and S. Shin, J. Phys. Soc. Jpn. 71, 347 (2002).
21. K. Westermark, A. Henningsson, H. Rensmo, S. Sodergren, H. Siegbahn, and A. Hagfeldt, Chem. Phys. 285, 157 (2002).