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Journal of Applied Physics

Volumn 95, Issue 11 II, 2004, Pages 6726-6728

Effects of patterning on perpendicular exchange bias probed by extraordinary Hall effect

(3) Menendez J L a Ravelosona, D a Chappert, C a

a UNIVERSITÉ PARIS SACLAY (France)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ANISOTROPY; ANTIFERROMAGNETIC MATERIALS; COBALT COMPOUNDS; ELECTRON BEAM LITHOGRAPHY; EPITAXIAL GROWTH; ETCHING; HALL EFFECT; HYSTERESIS; ION BEAMS; MAGNETIC DOMAINS; MAGNETIC FIELD EFFECTS; MAGNETIZATION; OXIDATION; SPUTTERING;

FIELD COOLING (FC) PROCESS; HYSTERESIS LOOPS; PERPENDICULAR EXCHANGE BIAS; ZERO-FIELD COOLING (ZFC) PROCESS;

FERROMAGNETIC MATERIALS;

EID: 2942659736 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.1667799 Document Type: Conference Paper

Times cited : (8)

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