Production of semiconductor grade high-purity iron

Thin Solid Films

Volumn 461, Issue 1, 2004, Pages 94-98

  Uchikoshi, Masahito ^a   Imaizumi, Junichi ^a   Shibuya, Hideka ^a   Kékesi, Tamás ^a   Mimura, Kouji ^a   Isshiki, Minoru ^a  

^a SONY CORPORATION   (Japan)

Author keywords

Anion exchange; Ar H2 plasma arc melting; Elution curves; Iron; Ultra high purity

Indexed keywords

CARBON; COPPER COMPOUNDS; CRYSTAL IMPURITIES; HYDROGEN; IRON COMPOUNDS; MOLYBDENUM COMPOUNDS; NITROGEN COMPOUNDS; OXYGEN; PLASMA ARC MELTING; REDUCTION; SILICON COMPOUNDS;

ANION EXCHANGE; ELUTION CURVES; HYDROGEN REDUCTION; ULTRA-HIGH PURITY;

SEMICONDUCTOR MATERIALS;

EID: 2942653018     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.02.076     Document Type: Conference Paper

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