Deposition and properties of microcrystalline silicon from chlorosilane precursor gases

Journal of Non-Crystalline Solids

Volumn 338-340, Issue 1 SPEC. ISS., 2004, Pages 147-150

  Beyer, W ^a   Carius, R ^a   Lejeune, M ^a   Muller J ^a   Rech, B ^a   Zastrow, U ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; DEPOSITION; FERMI LEVEL; HIGH PRESSURE EFFECTS; MICROSTRUCTURE; RAMAN SCATTERING; SOLAR CELLS;

COPLANAR CONFIGURATION; FILM DEPOSITION; PRECURSORS; RAMAN MEASUREMENTS;

SILICON;

EID: 2942624030     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2004.02.041     Document Type: Conference Paper

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