Epitaxial growth of atomic-scale smooth Ir electrode films on MgO buffered Si(1 0 0) substrates by PLD

Journal of Crystal Growth

Volumn 267, Issue 1-2, 2004, Pages 80-84

  Chen, Tonglai ^a   Li, Xiao Min ^a   Zhang, Xia ^a  

^a SHANGHAI INSTITUTE OF CERAMICS   (China)

Author keywords

A1. Crystal structure; A1. Growth mode; A1. Reflection high energy electron diffraction; A3. Laser epitaxy; A3. Physical vapor deposition processes; B1. Metals

Indexed keywords

ATOMIC FORCE MICROSCOPY; BUFFER STORAGE; CRYSTAL STRUCTURE; ELECTRODEPOSITION; EPITAXIAL GROWTH; IRIDIUM; MAGNESIA; METALS; PULSED LASER DEPOSITION; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SCANNING ELECTRON MICROSCOPY; SILICON; SUBSTRATES; X RAY DIFFRACTION;

LASER EPITAXY; PHYSICAL VAPOR DEPOSITION PROCESSES;

THIN FILMS;

EID: 2942607950     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2004.03.005     Document Type: Article

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