The possibility of carbonyl fluoride as a new CVD chamber cleaning gas

Journal of the Electrochemical Society

Volumn 151, Issue 5, 2004, Pages

  Mitsui, Yuki ^a,b   Ohira, Yutaka ^a,c   Yonemura, Taisuke ^a,d   Takaichi, Tsuyoshi ^a   Sekiya, Akira ^a   Beppu, Tatsuro ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b ASAHI GLASS CO LTD   (Japan)

^c DAIKIN INDUSTRIES LTD   (Japan)

^d Kanto Denka Kogyo Co Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; ENVIRONMENTAL IMPACT; EXHAUST GASES; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GAS EMISSIONS; GLOBAL WARMING; HYDROLYSIS; MATHEMATICAL MODELS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; TOXICITY;

CARBONYL FLUORIDE; CLEANING GASES; GREENHOUSE GASES; PERFLUOROCARBONS;

CARBONYLATION;

EID: 2942556703     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1669010     Document Type: Article

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